Author:
Abe M.,Motoyama K.,Kasama Y.,Arita K.,Ito F.,Yamamoto H.,Tagami M.,Tonegawa T.,Tsuchiya Y.,Fujii K.,Oda N.,Tada M.,Sekine M.,Hayashi Y.,Ohtake H.,Furutake N.,Narihiro M.,Arai K.,Takeuchi T.,Saito S.,Taiji T.
Cited by
1 articles.
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1. Lithography for Cu Damascene Fabrication;Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications;2009