High performance Pch-LDMOS transistors in wide range voltage from 35V to 200V SOI LDMOS platform technology
Author:
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx5/5871956/5890767/05890786.pdf?arnumber=5890786
Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Novel trench type complementary LIGBTs with common double drift layers for simple process and improvement in switching characteristics;2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM);2023-03-07
2. Novel trench type complementary LIGBTs with common double drift layers for simple process and improvement in switching characteristics;2023
3. Investigation on Total-Ionizing-Dose Radiation Response for 700 V Double-RESURF SOI LDMOS;IEEE Transactions on Nuclear Science;2022-05
4. Total-Ionizing-Dose Radiation-Induced Dual-Channel Leakage Current at Unclosed Edge Termination for High Voltage SOI LDMOS;IEEE Transactions on Electron Devices;2021-06
5. Total-Ionizing-Dose Irradiation-Induced Dielectric Field Enhancement for High-Voltage SOI LDMOS;IEEE Electron Device Letters;2019-04
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