Hybrid isolation process with deep diffusion and V-groove for reverse blocking IGBTs-Reference-Cited by-同舟云学术

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Hybrid isolation process with deep diffusion and V-groove for reverse blocking IGBTs

Published:2011-05 Issue: Volume: Page:
ISSN:
Container-title:2011 IEEE 23rd International Symposium on Power Semiconductor Devices and ICs
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Author:

Nakazawa Haruo,Ogino Masaaki,Wakimoto Hiroki,Nakajima Tsunehiro,Takahashi Yoshikazu,Lu David Hongfei

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx5/5871956/5890767/05890804.pdf?arnumber=5890804

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