Effect of UV-Ozone Treatment on the Performance of ZnO TFTs Fabricated by RF Sputtering Deposition Technique-Reference-Cited by-同舟云学术

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Effect of UV-Ozone Treatment on the Performance of ZnO TFTs Fabricated by RF Sputtering Deposition Technique

Published:2014-05 Issue:5 Volume:61 Page:1403-1409
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Jia-Ling Wu ,Han-Yu Lin ,Po-Hung Kuo ,Bo-Yuan Su ,Sheng-Yuan Chu ,Yu-Cheng Chen ,Su-Yin Liu ,Chia-Chiang Chang ,Chin-Jyi Wu

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/16/6802373/06802463.pdf?arnumber=6802463

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of the gas flow rate in the focused-oxygen plasma treatment of solution-processed indium oxide thin film transistors;Applied Surface Science;2024-01

2. Tuning lattice defects and photocurrent response of ZnO thin films by Mg doping and Ar-H2 atmospheric plasma treatment;Applied Surface Science;2023-11

3. A chemically treated IGZO-based highly visible-blind UV phototransistor with suppression of the persistent photoconductivity effect;Journal of Materials Chemistry C;2023

4. Micron channel length ZnO thin film transistors using bilayer electrodes;Journal of Colloid and Interface Science;2022-09

5. Implementation of Synaptic Device Using Ultraviolet Ozone Treated Water‐in‐Bisalt/Polymer Electrolyte‐Gated Transistor;Advanced Functional Materials;2021-12-29

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