Modeling and experimental studies of a transformer coupled plasma (TCP/sup TM/) source design for large area plasma processing
Author:
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Condensed Matter Physics,Nuclear and High Energy Physics
Link
http://xplorestaging.ieee.org/ielx1/27/10566/00491748.pdf?arnumber=491748
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
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3. Effect of Ar addition to an O2 plasma in an inductively coupled, traveling wave driven, large area plasma source: O2/Ar mixture plasma modeling and photoresist etching;Journal of Applied Physics;2001-10
4. Effect of ion energy on photoresist etching in an inductively coupled, traveling wave driven, large area plasma source;Journal of Applied Physics;2001-05-15
5. Photoresist etching in an inductively coupled, traveling wave driven, large area plasma source;Journal of Applied Physics;2001-01-15
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