Reduction of leakage current in chemical-vapor-deposited Ta/sub 2/O/sub 5/ thin films by furnace N/sub 2/O annealing
Author:
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx1/16/12670/00585562.pdf?arnumber=585562
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