Tri-Gate Transistor Architecture with High-k Gate Dielectrics, Metal Gates and Strain Engineering-Reference-Cited by-同舟云学术

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Tri-Gate Transistor Architecture with High-k Gate Dielectrics, Metal Gates and Strain Engineering

Published: Issue: Volume: Page:
ISSN:
Container-title:2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers.
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Author:

Kavalieros J.,Doyle B.,Datta S.,Dewey G.,Doczy M.,Jin B.,Lionberger D.,Metz M.,Rachmady W.,Radosavljevic M.,Shah U.,Zelick N.,Chau R.

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx5/11173/35986/01705211.pdf?arnumber=1705211

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