On Scheduling a Photolithograhy Toolset Based on a Deep Reinforcement Learning Approach with Action Filter-Reference-Cited by-同舟云学术

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On Scheduling a Photolithograhy Toolset Based on a Deep Reinforcement Learning Approach with Action Filter

Published:2021-12-12 Issue: Volume: Page:
ISSN:
Container-title:2021 Winter Simulation Conference (WSC)
language:
Short-container-title:

Author:

Kim Taehyung¹,Kim Hyeongook¹,Lee Tae-eog¹,Morrison James Robert²,Kim Eungjin³

Affiliation:

1. Korea Advanced Institute of Science and Technology,Department of Industrial and Systems Engineering,Daejeon,SOUTH KOREA,34141

2. School of Engineering Technology, Central Michigan University,Mt Pleasant,MI,USA,48859

3. Samsung Display Company,Smart IT Team,Asan-si,Chungcheongnam-Do,SOUTH KOREA,31454

Funder

Samsung Display Co., Ltd

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9715283/9715284/09715450.pdf?arnumber=9715450

Reference22 articles.

1. A dispatching rule-based approach to production scheduling in a printed circuit board manufacturing system

2. Simulation Based Multi-Objective Fab Scheduling by Using Reinforcement Learning

3. Complexity of Machine Scheduling Problems

4. Adaptive Dispatching Rule for Semiconductor Wafer Fabrication Facility

5. Playing atari with deep reinforcement learning;mnih;ArXiv Preprint,2013

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Reinforcement Learning Approach for Improved Photolithography Schedules;2023 Winter Simulation Conference (WSC);2023-12-10

2. Production-Level Artificial Intelligence Applications in Semiconductor Supply Chains;IEEE Transactions on Semiconductor Manufacturing;2023-11

3. Scheduling a Real-World Photolithography Area With Constraint Programming;IEEE Transactions on Semiconductor Manufacturing;2023-11

4. Problems and Solution Methods of Machine Scheduling in Semiconductor Manufacturing Operations: A Survey;Sustainability;2023-08-29

5. DTFab: A Digital Twin based Approach for Optimal Reticle Management in Semiconductor Photolithography;Journal of Systems Science and Systems Engineering;2023-05-01

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