Scheduling a Real-World Photolithography Area With Constraint Programming-Reference-Cited by-同舟云学术

Scheduling a Real-World Photolithography Area With Constraint Programming

Published:2023-11 Issue:4 Volume:36 Page:590-598
ISSN:0894-6507
Container-title:IEEE Transactions on Semiconductor Manufacturing
language:
Short-container-title:IEEE Trans. Semicond. Manufact.

Author:

Deenen Patrick¹^ORCID,Nuijten Wim²^ORCID,Akcay Alp³

Affiliation:

1. Department of Industrial Engineering and Innovation Sciences, Operations Planning Accounting and Control, Eindhoven University of Technology, Eindhoven, The Netherlands

2. Mathematics and Computer Science Department, Eindhoven University of Technology, Eindhoven, The Netherlands

3. Department of Industrial Engineering and Innovation Sciences, Eindhoven University of Technology, Eindhoven, The Netherlands

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/66/10299929/10214506.pdf?arnumber=10214506

Reference39 articles.

1. A two-stage adaptive fruit fly optimization algorithm for unrelated parallel machine scheduling problem with additional resource constraints

2. Constraint programming approach for multi-resource-constrained unrelated parallel machine scheduling problem with sequence-dependent setup times

3. Models and matheuristics for the unrelated parallel machine scheduling problem with additional resources

4. A constraint programming approach for solving unrelated parallel machine scheduling problem

5. Evaluating the Impacts of Reticle Requirements in Semiconductor Wafer Fabrication