The Dense Plasma Focus: A Versatile Dense Pinch for Diverse Applications
Author:
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Condensed Matter Physics,Nuclear and High Energy Physics
Link
http://xplorestaging.ieee.org/ielx5/27/6376194/06341852.pdf?arnumber=6341852
Cited by 112 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Development of a Miniaturized 2-Joule Pulsed Plasma Source Based on Plasma Focus Technology: Applications in Extreme Condition Materials and Nanosatellite Orientation;Micromachines;2024-09-01
2. The Investigation of Pre-ionization Effect on the Improvement of Pinch Quality and Increased Hard X-ray Radiation in a Dense Plasma Focus (DPF) Device;Journal of Fusion Energy;2024-06-09
3. Synthesis of multi-phase steel thin films by a low energy plasma focus device;Materials Chemistry and Physics;2024-06
4. Comparison of density profiles measured via laser interferometry with MHD simulations during shock wave reflection on mega-ampere dense plasma focus;Physics of Plasmas;2024-04-01
5. High-magnification Faraday rotation imaging and analysis of X-pinch implosion dynamics;Review of Scientific Instruments;2024-04-01
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