Wafer Level Fabrication of cMUT using Bonding and Interconnection Technique without TSV/TGV
Author:
Affiliation:
1. CSIR-Central Electronics Engineering Research Institute (CSIR-CEERI),Pilani,India
2. Institute for Microelectronics and Microsystems (IMM)-CNR,Rome,Italy
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10012686/10013085/10013111.pdf?arnumber=10013111
Reference7 articles.
1. A comparison between conventional and collapse-mode capacitive micromachined ultrasonic transducers in 10-MHz 1-D arrays
2. Capacitive microfabricated ultrasonic transducer (CMUT) probes: imaging advantages over PZT probes;panda;3rd International Workshop on Micromachined Ultrasonic Transducers,2003
3. Fabrication of Capacitive Micromachined Ultrasonic Transducer Arrays With Isolation Trenches Using Anodic Wafer Bonding
4. Fabrication of capacitive micromachined ultrasonic transducers with through-glass-via interconnects
5. Fabrication process for CMUT arrays with polysilicon electrodes, nanometre precision cavity gaps and through-silicon vias
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