Minature Microwave Inductive Copuled Plasma as a Source of Atomic Oxygen for Plasma Deposition of Thin Films-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Minature Microwave Inductive Copuled Plasma as a Source of Atomic Oxygen for Plasma Deposition of Thin Films

Published:2023-05-21 Issue: Volume: Page:1-1
ISSN:
Container-title:2023 IEEE International Conference on Plasma Science (ICOPS)
language:
Short-container-title:

Author:

Stefanović I.¹,Porteanu H.-E.²,Klute M.³,Brinkmann R.-P.³,Awakowicz P.¹

Affiliation:

1. Ruhr-University, Chair of Applied Electrodynamics and Plasma Technology,Bochum,Germany

2. Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik,Berlin,Germany

3. Ruhr-University, Institute for Theoretical Electrical Engineering,Bochum,Germany

Funder

DFG

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/10480908/10480921/10481013.pdf?arnumber=10481013

Reference4 articles.

1. Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films

2. An inductively coupled miniature plasma jet source at microwave frequencies

3. Optical characterization of a novel miniature microwave inductively coupled plasma source in nitrogen flow

4. Characterization of low-pressure microwave and radio frequency discharges in oxygen applying optical emission spectroscopy and multipole resonance probe

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP