0.9-A/mm, 2.6-V Flash-Like Normally-Off Al2O3/AlGaN/GaN MIS-HEMTs Using Charge Trapping Technique

Author:

Hou BinORCID,Ma XiaohuaORCID,Zhu JiejieORCID,Yang LingORCID,Chen Weiwei,Mi Minhan,Zhu Qing,Chen Lixiang,Zhang Rong,Zhang MengORCID,Zhou Xiaowei,Hao Yue

Funder

Key Program of the National Natural Science Foundation of China

National High Technology Research and Development Program

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. GaN-Based Charge Trapping Memory With an AlN Interfacial Layer for Multi-State Operation;IEEE Electron Device Letters;2024-07

2. Charge trapping layer enabled high-performance E-mode GaN HEMTs and monolithic integration GaN inverters;Applied Physics Letters;2024-06-10

3. High VTH and Breakdown Enhancement-Mode GaN HEMTs for Power ICs Application Using Charge Trapping Layer;2024 36th International Symposium on Power Semiconductor Devices and ICs (ISPSD);2024-06-02

4. Study of normally-off AlGaN/GaN HEMTs with recessed p-GaN gate;International Conference on Mechatronic Engineering and Artificial Intelligence (MEAI 2023);2024-02-28

5. Demonstration of β-Ga2O3 nonvolatile flash memory for oxide electronics;Japanese Journal of Applied Physics;2023-06-01

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