High performance lithographic hotspot detection using hierarchically refined machine learning

Author:

Ding Duo,Torres Andres J.,Pikus Fedor G.,Pan David Z.

Publisher

IEEE

Cited by 48 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Edge Pair-Based Layout Pattern Matching using Space-filling Curve;2024 2nd International Symposium of Electronics Design Automation (ISEDA);2024-05-10

2. Methodology for Lithography Hotspot Detection using ResNet50V2 and Model soups;2024 International Conference on Electronics, Information, and Communication (ICEIC);2024-01-28

3. A General Layout Pattern Clustering Using Geometric Matching-based Clip Relocation and Lower-bound Aided Optimization;ACM Transactions on Design Automation of Electronic Systems;2023-10-16

4. Geometrical positioning surveying-based features for BEOL line-end-pull-back modeling using regression-based machine-learning;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-06-29

5. Machine Learning–Based VLSI Test and Verification;Machine Learning for VLSI Chip Design;2023-06-23

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