Hybrid lithography optimization with E-Beam and immersion processes for 16nm 1D gridded design
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Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx5/6156603/6164924/06165047.pdf?arnumber=6165047
Cited by 30 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. DeePattern: Layout Pattern Generation With Transforming Convolutional Auto-Encoder;IEEE Transactions on Semiconductor Manufacturing;2022-02
2. Discrete relaxation method for hybrid e-beam and triple patterning lithography layout decomposition;Journal of Ambient Intelligence and Humanized Computing;2021-02-12
3. On Coloring Rectangular and Diagonal Grid Graphs for Multipatterning and DSA Lithography;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2020-06
4. DSA-Compliant Routing for 2-D Patterns Using Block Copolymer Lithography;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2019-02
5. CRMA: Incorporating Cut Redistribution With Mask Assignment to Enable the Fabrication of 1-D Gridded Design;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2018-10
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