TCAD-Based Predictive NBTI Framework for Sub-20-nm Node Device Design Considerations
Author:
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx7/16/7739934/07589064.pdf?arnumber=7589064
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1. Aggravated NBTI reliability due to hard-to-detect open defects;Microelectronics Reliability;2024-09
2. Optimization of Negative Differential Conductance (NDC) Point for Multi Gate Devices Considering Self Heating Effects Using Surface to Volume Ratio (SVR);Springer Proceedings in Physics;2024
3. Comparative Characterization of NWFET and FinFET Transistor Structures Using TCAD Modeling;Micromachines;2022-08-11
4. Negative-Bias Temperature Instability of p-GaN Gate GaN-on-Si Power Devices;IEEE Transactions on Device and Materials Reliability;2022-06
5. Comparative Analysis of Hot Carrier Degradation (HCD) in 10-nm Node nMOS/pMOS FinFET Devices;IEEE Transactions on Electron Devices;2020-12
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