Unique Gate Bias Dependence of Dynamic ON-Resistance in MIS-Gated AlGaN/GaN HEMTs and Its Dependence on Gate Control Over the 2-DEG
Author:
Affiliation:
1. Department of Electronic Systems Engineering, Indian Institute of Science, Bengaluru, India
Funder
Department of Science and Technology (DST), Government of India, under their Core Research Grant (CRG) and Advanced Manufacturing Technology (AMT) Programs
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx7/16/9722602/09697090.pdf?arnumber=9697090
Reference26 articles.
1. Suppression of current collapse in AlGaN/GaN MISHFET with carbon- doped GaN/undoped GaN multi-layered buffer structure
2. Part I: Physical Insight Into Carbon-Doping-Induced Delayed Avalanche Action in GaN Buffer in AlGaN/GaN HEMTs
3. Part II: Proposals to Independently Engineer Donor and Acceptor Trap Concentrations in GaN Buffer for Ultrahigh Breakdown AlGaN/GaN HEMTs
4. Analysis of Reduction in Lag Phenomena and Current Collapse in Field-Plate AlGaN/GaN HEMTs With High Acceptor Density in a Buffer Layer
5. Control of Buffer-Induced Current Collapse in AlGaN/GaN HEMTs Using SiNx Deposition
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1. Dynamic RON Degradation Suppression by Gate Field Plate in Partially Recessed AlGaN/GaN Metal–Insulator–Semiconductor High‐Electron‐Mobility Transistors;physica status solidi (a);2024-06-11
2. Dynamic RON Degradation in AlGaN/GaNMIS-HEMTs With Si3N4 or Si3N4/ZrO2Passivation Layer;IEEE Transactions on Electron Devices;2024-05
3. Mechanisms of Step-Stress Degradation in Carbon-Doped 0.15-μm AlGaN/GaN HEMTs for Power RF Applications;IEEE Transactions on Device and Materials Reliability;2023-12
4. Small V th Shift and Low Dynamic R on in GaN MOSHEMT With ZrO2 Gate Dielectric;IEEE Transactions on Electron Devices;2023-11
5. Unique Role of Hot-Electron Induced Self-Heating in Determining Gate-Stack Dependent Dynamic R ON of AlGaN/GaN HEMTs Under Semi-on State;IEEE Transactions on Electron Devices;2022-12
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