Optimization of NiO/β-Ga2O3 Heterojunction Diodes for High-Power Application
Author:
Affiliation:
1. State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-sen University, Guangzhou, China
2. Shenzhen Graduated School, Peking University, Shenzhen, China
Funder
Science and Technology Project of Guangdong Province, China
Shenzhen Science and Technology Innovation Committee Project
Basic and Applied Basic Research Foundation of Guangdong Province
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx7/16/9901396/09873894.pdf?arnumber=9873894
Reference26 articles.
1. 1-kV Sputtered p-NiO/n-Ga2O3 Heterojunction Diodes With an Ultra-Low Leakage Current Below $1~\mu$ A/cm2
2. 1.37 kV/12 A NiO/β-Ga2O3 Heterojunction Diode With Nanosecond Reverse Recovery and Rugged Surge-Current Capability
3. 1.95-kV Beveled-Mesa NiO/β-Ga2O3 Heterojunction Diode With 98.5% Conversion Efficiency and Over Million-Times Overvoltage Ruggedness
4. Ultra-wide bandgap semiconductor Ga2O3 power diodes
5. Performance-enhanced NiO/?-Ga2O3 heterojunction diodes fabricated on an etched ?-Ga2O3 surface;lu xu;Appl Surf Sci,2022
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