Compensating for the Initialization and Sampling of EWMA Run-to-Run Controlled Processes

Author:

Good Richard P,Pabst Detlef,Stirton James Broc

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. The Value of In-Line Metrology for Advanced Process Control: AM: Advanced Metrology;2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2024-05-13

2. Manufacturing Cost Saving Through Reduced Metrology Using Time Series Analysis;2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2023-05-01

3. A Revised Weight-Tuning Control Framework for Transient Optimization in Process Industry Using R2R Control;Proceedings of the 2022 4th International Conference on Robotics, Intelligent Control and Artificial Intelligence;2022-12-16

4. Adopting EWMA Filter on a Fast Sampling Wired Link Contention in WirelessHART Control System;IEEE Transactions on Instrumentation and Measurement;2016-04

5. A Literature Review on Sampling Techniques in Semiconductor Manufacturing;IEEE Transactions on Semiconductor Manufacturing;2013-05

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