Impact of PECVD characteristics on metrics of a Plasma-Assisted Vertically Aligned Carbon Nanotube FET (VA-CNTFET) device
Author:
Affiliation:
1. Delhi Technological University,Department of Applied Physics,Delhi,India,110085
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9828864/9828869/09828950.pdf?arnumber=9828950
Reference21 articles.
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4. Mechanisms of plasma-assisted catalyzed growth of carbon nanofibres: a theoretical modeling
5. Growth of carbon nanotubes by microwave plasma-enhanced chemical vapor deposition at low temperature
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