Synthesis of Lithography Test Patterns Using Machine Learning Model-Reference-Cited by-同舟云学术

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Synthesis of Lithography Test Patterns Using Machine Learning Model

Published:2021-02 Issue:1 Volume:34 Page:49-57
ISSN:0894-6507
Container-title:IEEE Transactions on Semiconductor Manufacturing
language:
Short-container-title:IEEE Trans. Semicond. Manufact.

Author:

Kareem Pervaiz^ORCID,Shin Youngsoo^ORCID

Funder

National Research Foundation of Korea (NRF) of Ministry of Science and ICT

World Class 300 Research and Development Project of MSS

BK21 Plus Program

NRF

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/66/9345940/09327479.pdf?arnumber=9327479

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1. RETRACTED: MSFGQ: Design of an efficient Multiparametric model for improving sub-field scheduling performance via novel GA & Q-Learning optimizations;Journal of Intelligent & Fuzzy Systems;2024-05-04

2. Test pattern generation by conditional generative model labeled by image parameters;DTCO and Computational Patterning III;2024-04-10

3. AI-EDA: Toward a Holistic Approach to AI-Powered EDA;2023 ACM/IEEE 5th Workshop on Machine Learning for CAD (MLCAD);2023-09-10

4. Predicting photoresist sensitivity using machine learning;Bulletin of the Korean Chemical Society;2023-08-23

5. LayouTransformer;Proceedings of the 41st IEEE/ACM International Conference on Computer-Aided Design;2022-10-30

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