LayouTransformer

Author:

Wen Liangjian1,Zhu Yi1,Ye Lei1,Chen Guojin2,Yu Bei2,Liu Jianzhuang1,Xu Chunjing1

Affiliation:

1. Huawei Noah's Ark Lab

2. CUHK

Publisher

ACM

Reference30 articles.

1. J.-R. Gao , X. Xu , B. Yu , and D. Z. Pan , " Mosaic: Mask optimizing solution with process window aware inverse correction," in 51st ACM/EDAC/IEEE Design Automation Conference (DAC) , 2014 . J.-R. Gao, X. Xu, B. Yu, and D. Z. Pan, "Mosaic: Mask optimizing solution with process window aware inverse correction," in 51st ACM/EDAC/IEEE Design Automation Conference (DAC), 2014.

2. Enhanced opc recipe coverage and early hotspot detection through automated layout generation and analysis;Hamouda A.;Optical Microlithography,2017

3. B. Jiang H. Zhang J. Yang and E. F. Y. Young "A fast machine learning-based mask printability predictor for opc acceleration " in the 24th Asia and South Pacific Design Automation Conference 2019 pp. 412--419. B. Jiang H. Zhang J. Yang and E. F. Y. Young "A fast machine learning-based mask printability predictor for opc acceleration " in the 24th Asia and South Pacific Design Automation Conference 2019 pp. 412--419.

4. J. Kuang , W.-K. Chow , and E. F. Y. Young , "A robust approach for process variation aware mask optimization," in Design , Automation Test in Europe Conference Exhibition (DATE) , 2015 , pp. 1591 -- 1594 . J. Kuang, W.-K. Chow, and E. F. Y. Young, "A robust approach for process variation aware mask optimization," in Design, Automation Test in Europe Conference Exhibition (DATE), 2015, pp. 1591--1594.

5. R. Chen , W. Zhong , H. Yang , H. Geng , X. Zeng , and B. Yu , " Faster region-based hotspot detection," in 56th ACM/IEEE Design Automation Conference (DAC) , 2019 . R. Chen, W. Zhong, H. Yang, H. Geng, X. Zeng, and B. Yu, "Faster region-based hotspot detection," in 56th ACM/IEEE Design Automation Conference (DAC), 2019.

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1. ControLayout: Conditional Diffusion for Style-Controllable and Violation-Fixable Layout Pattern Generation;Proceedings of the Great Lakes Symposium on VLSI 2024;2024-06-12

2. Test pattern generation by conditional generative model labeled by image parameters;DTCO and Computational Patterning III;2024-04-10

3. Open-source differentiable lithography imaging framework;DTCO and Computational Patterning III;2024-04-10

4. Machine Learning in EDA: When and How;2023 ACM/IEEE 5th Workshop on Machine Learning for CAD (MLCAD);2023-09-10

5. DiffPattern: Layout Pattern Generation via Discrete Diffusion;2023 60th ACM/IEEE Design Automation Conference (DAC);2023-07-09

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