Methodology for Plasma Diagnosis and Accurate Virtual Measurement Modeling Using Optical Emission Spectroscopy
Author:
Affiliation:
1. Department of Electrical and Electronic Engineering, Yonsei University, Seoul, South Korea
Funder
YBASE R&E Institute, a Brain Korea 21 Four Program, Yonsei University
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Instrumentation
Link
http://xplorestaging.ieee.org/ielx7/7361/10102602/10064152.pdf?arnumber=10064152
Reference21 articles.
1. Optical emission spectroscopy as a diagnostic for plasmas in liquids: opportunities and pitfalls
2. Oxygen discharges diluted with argon: dissociation processes
3. Effects of Ar Addition to O2 Plasma on Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films
4. Effect of oxygen addition to an argon plasma on etching selectivity of poly(methyl methacrylate) to polystyrene
5. Virtual Metrology for Etch Profile in Silicon Trench Etching With SF₆/O₂/Ar Plasma
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