Generation of Boron-Rich Plasma by a Pulsed Vacuum Arc With Lanthanum Hexaboride Cathode
Author:
Funder
Russian Science Foundation
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Condensed Matter Physics,Nuclear and High Energy Physics
Link
http://xplorestaging.ieee.org/ielx7/27/8000748/07852487.pdf?arnumber=7852487
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1. DEPOSITION OF PURE BORON COATINGS BY MAGNETRON SPUTTERING AND INVESTIGATION OF THEIR PROPERTIES;High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes;2024
2. DC PLANAR MAGNETRON SPUTTER DEPOSITION OF BORON THIN FILMS AND THEIR PROPERTIES;High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes;2023
3. Temporal Evolution and Operation Peculiarities of Plasma Source Based on Vacuum Arc with CeO2 Cathode;Plasma Chemistry and Plasma Processing;2022-10-08
4. Magnetron sputtering and electron beam evaporation systems for pure boron thin film coatings;Journal of Physics: Conference Series;2022-07-01
5. Towards Next-Generation Small-Size Boron Ion Implanting Apparatus;Proceedings of the Latvian Academy of Sciences. Section B. Natural, Exact, and Applied Sciences.;2022-04-01
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