Sub-100-nm gate-length scaling of vertical InAs/InGaAs nanowire MOSFETs on Si
Author:
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/8255107/8268301/08268408.pdf?arnumber=8268408
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology;Nanomaterials;2024-05-09
2. Lg = 50 nm Gate-All-Around In0.53Ga0.47As Nanosheet MOSFETs with Regrown In0.53Ga0.47As Contacts;Electronics;2022-08-31
3. High-density logic-in-memory devices using vertical indium arsenide nanowires on silicon;Nature Electronics;2021-12
4. A unified compact model for electrostatics of III–V GAA transistors with different geometries;Journal of Computational Electronics;2021-08-07
5. Analytical drain current and performance evaluation for inversion type InGaAs gate-all-around MOSFET;AIP Advances;2021-06-01
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