The role of nanoclusters in reducing hole trapping in ion implanted oxides
Author:
Affiliation:
1. Naval Res. Lab., Washington, DC, USA
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Nuclear Energy and Engineering,Nuclear and High Energy Physics
Link
http://xplorestaging.ieee.org/ielx5/23/28269/01263826.pdf?arnumber=1263826
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