Virtual Metrology of WAT Value With Machine Learning Based Method
Author:
Affiliation:
1. Shanghai Integrated Circuits R&D Center Co., Ltd.,Shanghai,China
2. Shanghai Huali Microelectronics Corporation,Shanghai,China
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9856647/9856709/09856736.pdf?arnumber=9856736
Reference3 articles.
1. Global and Local Virtual Metrology Models for a Plasma Etch Process
2. Real-time virtual metrology and control for plasma etch
3. Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF 6 /O 2 /Ar Capacitively Coupled Plasma;kwon;AEC/APC Symposium Asia,0
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