Real-time virtual metrology and control for plasma etch-Reference-Cited by-同舟云学术

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Real-time virtual metrology and control for plasma etch

Published:2012-04 Issue:4 Volume:22 Page:666-676
ISSN:0959-1524
Container-title:Journal of Process Control
language:en
Short-container-title:Journal of Process Control

Author:

Lynn Shane A.,MacGearailt Niall,Ringwood John V.

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,Modeling and Simulation,Control and Systems Engineering

Reference34 articles.

1. Cramming more components onto integrated circuits;Moore;Electronics,1965

2. I. Technology Roadmap for Semiconductors, Executive Summary 2009, Technical Report,2009

3. Lecture Notes on Principles of Plasma Processing;Chen,2003

4. Estimation and control in semiconductor etch: practice and possibilities;Ringwood;IEEE Trans. Semicond. Manuf.,2010

5. Fundamentals of Semiconductor Manufacturing and Process Control;May,2006

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