Double bagging trees with weighted sampling for predictive maintenance and management of etching equipment-Reference-Cited by-同舟云学术

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Double bagging trees with weighted sampling for predictive maintenance and management of etching equipment

Published:2024-03 Issue: Volume:135 Page:103175
ISSN:0959-1524
Container-title:Journal of Process Control
language:en
Short-container-title:Journal of Process Control

Author:

Lee Gyeong Taek,Lim Hyeong Gu,Wang Tianhui,Zhang Gejia,Jeong Myong Kee

Funder

Center for Discrete Mathematics and Theoretical Computer Science

National Science Foundation

Publisher

Elsevier BV

Reference35 articles.

1. Estimation and control in semiconductor etch: practice and possibilities;Ringwood;IEEE Trans. Semicond. Manuf.,2010

2. Stabilization of sheet resistance for metal lines by formation of etch stop layer (ESL) trench structure;Choi;Microelectron. Eng.,2010

3. Virtual metrology for etch profile in silicon trench etching with SF/O/Ar plasma;Choi;IEEE Trans. Semicond. Manuf.,2022

4. Virtual metrology modeling for plasma etch operations;Zeng;IEEE Trans. Semicond. Manuf.,2009

5. Adaptive virtual metrology design for semiconductor dry etching process through locally weighted partial least squares;Hirai;IEEE Trans. Semicond. Manuf.,2015

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1. Research on Momentum Dynamic Prediction Based on BP Neural Network and Support Vector Machine Algorithm;2024 2nd International Conference on Mechatronics, IoT and Industrial Informatics (ICMIII);2024-06-12

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