Advances in UV-lithographic patterning of multi-layer waveguide stack for single mode polymeric RDL-Reference-Cited by-同舟云学术

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Advances in UV-lithographic patterning of multi-layer waveguide stack for single mode polymeric RDL

Published:2022-09-13 Issue: Volume: Page:
ISSN:
Container-title:2022 IEEE 9th Electronics System-Integration Technology Conference (ESTC)
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Author:

Weyers David¹,Nieweglowski Krszystof¹,Bock Karlheinz¹

Affiliation:

1. Institute of Electronic Packaging Technology, Technical University of Dresden,Dresden,Germany,D-01062

Funder

Federal Ministry of Education and Research

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9939139/9939378/09939517.pdf?arnumber=9939517

Reference15 articles.

1. Analysis of polymeric singlemode waveguides for inter-system communication

2. Hybrid lithography approach for single mode polymeric waveguides and out-of-plane coupling mirrors

3. Out-of-Plane Mirrors for Single-Mode Polymeric RDL using Direct Laser Writing

4. Design and optimization of planar multimode waveguides for high speed board-level optical interconnects

5. Development of a wafer-level integration technology for photonic transceivers based on planar lightwave circuits

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Hybrid Lithography Fabrication of Single Mode Optics for Signal Redistribution and Coupling;2023 24th European Microelectronics and Packaging Conference & Exhibition (EMPC);2023-09-11

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