Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Cited by
16 articles.
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1. High etching rates of bulk Nb in Ar/Cl2 microwave discharge;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2009-03
2. Plasma treatment of bulk niobium surface for SRF cavities;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2006-12
3. Investigation of etching techniques for superconductive Nb/Al-Al/sub 2/O/sub 3//Nb fabrication processes;IEEE Transactions on Applied Superconductivity;1993-03
4. Reactive ion etching of Nb/A1Ox/Nb for Josephson technology;Thin Solid Films;1991-12
5. Dry etching of niobium using CCl2F2and CF4: A comparison;Journal of Applied Physics;1990-11-15