Fast and Precise Temperature Control for a Semiconductor Vertical Furnace via Heater-Cooler Integration-Reference-Cited by-同舟云学术

Fast and Precise Temperature Control for a Semiconductor Vertical Furnace via Heater-Cooler Integration

Published:2023-05 Issue:2 Volume:36 Page:197-204
ISSN:0894-6507
Container-title:IEEE Transactions on Semiconductor Manufacturing
language:
Short-container-title:IEEE Trans. Semicond. Manufact.

Author:

Ohnishi Wataru¹^ORCID,Hirata Akira²,Shibatsuji Ryosuke²,Yamaguchi Tatsuya²

Affiliation:

1. Department of Electrical Engineering and Information Systems, Graduate School of Engineering, The University of Tokyo, Tokyo, Japan

2. Thermal Control Engineering Department, Tokyo Electron Technology Solutions Ltd, Yamanashi, Japan

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/66/10119187/10015194.pdf?arnumber=10015194

Reference38 articles.

1. Model reduction for optimization of rapid thermal chemical vapor deposition systems

2. Innovative Approach on Dynamic Behavior of LPCVD Nitride Process on Diffusion Furnace : Equipment Optimization/Advanced Process Control/Contamination Free Manufacturing

3. Integrated identification and control for diffusion/CVD furnaces

4. Vertical furnaces for thin film deposition and annealing contributing to low-cost, high-performance semiconductor device manufacturing;kunii;Hitachi Rev,2011

5. Temperature distribution in semiconductor wafers heated in a vertical diffusion furnace

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