Author:
Hirayama M.,Matsukawa T.,Tsubouchi N.,Nakata H.
Cited by
2 articles.
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1. Oxidation Technology—The Application of High Pressure Oxidation to VLSI;Handbook of Advanced Semiconductor Technology and Computer Systems;1988
2. Gate oxide integrity of MOS/SOS devices;IEEE Transactions on Electron Devices;1986-01