Perspective on Low-dimensional Channel Materials for Extremely Scaled CMOS
Author:
Affiliation:
1. Taiwan Semiconductor Manufacturing Company,Corporate Research,Hsinchu,Taiwan
2. Taiwan Semiconductor Manufacturing Company,Corporate Research,San Jose,USA
3. Taiwan Semiconductor Manufacturing Company,Pathfinding,Hsinchu,Taiwan
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9830116/9830138/09830447.pdf?arnumber=9830447
Reference8 articles.
1. Aligned, high-density semiconducting carbon nanotube arrays for high-performance electronics
2. Ultralow contact resistance between semimetal and monolayer semiconductors
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