Improved Air Spacer Co-Integrated with Self-Aligned Contact (SAC) and Contact over Active Gate (COAG) for Highly Scaled CMOS Technology-Reference-Cited by-同舟云学术

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Improved Air Spacer Co-Integrated with Self-Aligned Contact (SAC) and Contact over Active Gate (COAG) for Highly Scaled CMOS Technology

Published:2020-06 Issue: Volume: Page:
ISSN:
Container-title:2020 IEEE Symposium on VLSI Technology
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Author:

Cheng Kangguo,Park Chanro,Wu Heng,Li Juntao,Nguyen Son,Zhang Jingyun,Wang Miaomiao,Mehta Sanjay,Liu Zuoguang,Conti Richard,Loubet Nicolas,Frougier Julien,Greene Andrew,Yamashita Tenko,Haran Bala,Divakaruni Rama

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9264988/9264985/09265096.pdf?arnumber=9265096

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