Integration Method of Millimeter Wave Chip Cavity Passive Components Based on Metal Assisted Chemical Etching
Author:
Affiliation:
1. Hefei University of Technology,School of Microelectronics,Hefei,China
2. University of Illinois, Urbana-Champaign,Department of Electrical and Computer Engineering,Champaign-Urbana,United States
Funder
National Natural Science Foundation of China
Fundamental Research Funds for the Central Universities
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9631552/9631554/09795937.pdf?arnumber=9795937
Reference7 articles.
1. Metal assisted chemical etching for high aspect ratio nanostructures: A review of characteristics and applications in photovoltaics
2. Micromachined rectangular-coaxial transmission lines
3. The study of compensative structure assisted convex and concave corner structures etching by inductively coupled plasma-reactive ion etch (ICP-RIE);lin,2015
4. Metal-Assisted Chemical Etching Method Subjected to Micro/Nano Device Fabrication[C];International Conference on Solid-State Sensors Actuators and Microsystems & Eurosensors XXXIII,2019
5. Photonic crystal membrane reflectors by magnetic field-guided metal-assisted chemical etching
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