Author:
Xu J.P.,Lai P.T.,Cheng Y.C.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Cited by
5 articles.
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1. Impact of RF stress on the low-frequency noise in nMOSFETs;IEICE Electronics Express;2021-07-25
2. High-energy ion irradiation effects on thin oxide p-channel MOSFETs;IEEE Transactions on Nuclear Science;2002-06
3. Electrical noise as a reliability indicator in electronic devices and components;IEE Proceedings - Circuits, Devices and Systems;2002-02-01
4. Physical mechanisms for pulsed AC stress degradation in thin gate oxide MOSFETs;Proceedings of the 9th International Symposium on the Physical and Failure Analysis of Integrated Circuits (Cat. No.02TH8614)
5. High energy ion irradiation effects on thin oxide p-channel MOSFETs;RADECS 2001. 2001 6th European Conference on Radiation and Its Effects on Components and Systems (Cat. No.01TH8605)