Diamond-Like Silicon-Carbon Films Preparation at Different Frequencies of Plasma-Chemical Decomposition
Author:
Affiliation:
1. National Research University "MPEI",Electronics and Nanoelectronics Department,Moscow,Russian Federation
Funder
Russian Science Foundation
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10086702/10086686/10086836.pdf?arnumber=10086836
Reference18 articles.
1. The properties of alloy fabricated by the high rate deposition method in low frequency glow discharge plasma;sherchenkov;Mater Elektron Tekh,2003
2. Deposition of metal-containing nanocomposite films with silicon-carbon matrix;shupegin;Zavod Lab Diagn Mater,2013
3. Particle formation in SiO film deposition by low frequency plasma enhanced chemical vapor deposition;yamaguchi;Journal of Applied Physics,1998
4. Control of Properties of Diamond-Like Silicon–Carbon Films
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