Particle formation in SiOx film deposition by low frequency plasma enhanced chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.366722
Reference13 articles.
1. Particulate generation in silane/ammonia rf discharges
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4. Optical emission diagnostics of H2+CH4 50‐Hz–13.56‐MHz plasmas for chemical vapor deposition
5. Properties of hydrogenated amorphous silicon films prepared by low‐frequency (50 Hz) plasma‐enhanced chemical‐vapor deposition
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2. Field Frequency Variation during Plasma-Chemical Deposition of Silicon-Carbon Films as a Method for Their Structural Modification;Поверхность. Рентгеновские, синхротронные и нейтронные исследования;2023-10-01
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4. Characterization of Thermal Oxides on 4H-SiC Epitaxial Substrates Using Fourier-Transform Infrared Spectroscopy;Applied Spectroscopy;2016-07-12
5. Effect of Process Parameters on Chemistry, Growth Rate and Nano-Sized Particulate Formation of Atmospheric Plasma Deposited, nm Thick Siloxane Coatings;Journal of Nanoscience and Nanotechnology;2009-06-01
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