One Class Process Anomaly Detection Using Kernel Density Estimation Methods-Reference-Cited by-同舟云学术

One Class Process Anomaly Detection Using Kernel Density Estimation Methods

Published:2022-08 Issue:3 Volume:35 Page:457-469
ISSN:0894-6507
Container-title:IEEE Transactions on Semiconductor Manufacturing
language:
Short-container-title:IEEE Trans. Semicond. Manufact.

Author:

Lang Christopher I.¹^ORCID,Sun Fan-Keng¹,Lawler Bruce²,Dillon Jack³,Dujaili Ash Al³,Ruth John³,Cardillo Peter³,Alfred Perry³,Bowers Alan³,Mckiernan Adrian³,Boning Duane S.¹^ORCID

Affiliation:

1. Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, MA, USA

2. Machine Intelligence for Manufacturing and Operations, Massachusetts Institute of Technology, Cambridge, MA, USA

3. Analog Devices Inc., Norwood, MA, USA

Funder

Analog Devices

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/66/9851188/09790891.pdf?arnumber=9790891

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