NN-Based Key-Variable Selection Method for Enhancing Virtual Metrology Accuracy-Reference-Cited by-同舟云学术

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NN-Based Key-Variable Selection Method for Enhancing Virtual Metrology Accuracy

Published:2009-02 Issue:1 Volume:22 Page:204-211
ISSN:0894-6507
Container-title:IEEE Transactions on Semiconductor Manufacturing
language:
Short-container-title:IEEE Trans. Semicond. Manufact.

Author:

Lin Tung-Ho,Cheng Fan-Tien,Wu Wei-Ming,Kao Chi-An,Ye Aeo-Juo,Chang Fu-Chien

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/66/4773471/04773490.pdf?arnumber=4773490

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4. A Realizable Overlay Virtual Metrology System in Semiconductor Manufacturing: Proposal, Challenges and Future Perspective;IEEE Access;2021

5. Parameters Adjustment Optimization for Prepreg of Copper Clad Laminate Based on Virtual Metrology;Applied Sciences;2020-11-27

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