Monitoring of TiSi/sub 2/ formation on narrow polycrystalline silicon lines using Raman spectroscopy-Reference-Cited by-同舟云学术

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Monitoring of TiSi/sub 2/ formation on narrow polycrystalline silicon lines using Raman spectroscopy

Published:1998-05 Issue:5 Volume:19 Page:171-173
ISSN:0741-3106
Container-title:IEEE Electron Device Letters
language:
Short-container-title:IEEE Electron Device Lett.

Author:

Lim E.H.,Karunasiri G.,Chua S.J.,Wong H.,Pey K.L.,Lee K.H.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx4/55/14628/00669738.pdf?arnumber=669738

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