Atomic Oxygen densities in MMWICP jet: TALIF vs. OES-Reference-Cited by-同舟云学术

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Atomic Oxygen densities in MMWICP jet: TALIF vs. OES

Published:2024-06-16 Issue: Volume: Page:1-1
ISSN:
Container-title:2024 IEEE International Conference on Plasma Science (ICOPS)
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Author:

Stefanović I.¹,Porteanu H.-E.²,Bibinov N.¹,Klute M.³,Brinkmann R.-P.³,Awakowicz P.¹

Affiliation:

1. Ruhr University Bochum,Chair of Applied Electrodynamics and Plasma Technology,Department of Electrical Engineering and Information Science,Bochum,North Rhine-Westphalia,Germany

2. Ferdinand-Braun-Institute,Leibniz-Institutfür Höchstfrequenztechnik (FBH), Berlin,Berlin,Germany

3. Ruhr University Bochum,Chair of Theoretical Electrical Engineering,Department of Electrical Engineering and Information Science,Bochum,North Rhine-Westphalia,Germany

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx8/10625766/10625775/10627212.pdf?arnumber=10627212

Reference4 articles.

1. Optical characterization of a novel miniature microwave inductively coupled plasma source in nitrogen flow

2. Characterization of low-pressure microwave and radio frequency discharges in oxygen applying optical emission spectroscopy and multipole resonance probe

3. Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films

4. Absolute calibration of atomic density measurements by laser-induced fluorescence spectroscopy with two-photon excitation

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