Ultrathin Titanium Dioxide Nanolayers by Atomic Layer Deposition for Surface Passivation of Crystalline Silicon-Reference-Cited by-同舟云学术

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Ultrathin Titanium Dioxide Nanolayers by Atomic Layer Deposition for Surface Passivation of Crystalline Silicon

Published:2016-05 Issue:3 Volume:6 Page:649-653
ISSN:2156-3381
Container-title:IEEE Journal of Photovoltaics
language:
Short-container-title:IEEE J. Photovoltaics

Author:

Gad Karim Mohamed¹,Vossing Daniel¹,Richter Armin²,Rayner Bruce³,Reindl Leonhard M.¹,Mohney Suzanne E.⁴,Kasemann Martin¹

Affiliation:

1. Department of Microsystems Engineering (IMTEK), University of Freiburg, Freiburg, Germany

2. Fraunhofer Institute for Solar Energy Systems, Freiburg, Germany

3. Krut J. Lesker Company, Jefferson Hills, PA, USA

4. Department of Materials Science and Engineering, The Pennsylvania State University, University Park, PA, USA

Funder

Penn State Institutes of Energy

Environment and Wissenschaftliche Gesellschaft Freiburg im Breisgau

National Science Foundation National Nanotechnology Infrastructure Network

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/5503869/7456349/07450151.pdf?arnumber=7450151

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