Author:
Chen Guojin,Yu Ziyang,Liu Hongduo,Ma Yuzhe,Yu Bei
Cited by
18 articles.
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1. Ultrafast Source Mask Optimization via Conditional Discrete Diffusion;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2024-07
2. Model-based OPC Extension in OpenILT;2024 2nd International Symposium of Electronics Design Automation (ISEDA);2024-05-10
3. A self-training end-to-end mask optimization framework based on semantic segmentation network;Integration;2024-05
4. Open-source differentiable lithography imaging framework;DTCO and Computational Patterning III;2024-04-10
5. FuILT: Full Chip ILT System With Boundary Healing;Proceedings of the 2024 International Symposium on Physical Design;2024-03-12