Microwave plasma devices—Promise and progress-Reference-Cited by-同舟云学术

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Microwave plasma devices—Promise and progress

Published:1971 Issue:1 Volume:59 Page:4-19
ISSN:0018-9219
Container-title:Proceedings of the IEEE
language:
Short-container-title:Proc. IEEE

Author:

Crawford F.W.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering

Link

http://xplorestaging.ieee.org/ielx5/5/31140/01450014.pdf?arnumber=1450014

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ultrafast plasma method allows rapid immobilization of monatomic copper on carboxyl-deficient g-C3N4 for efficient photocatalytic hydrogen production;Frontiers in Chemistry;2022-08-26

2. Numerical and experimental analysis of radiation from a microwave plasma source of the TIAGO type;Plasma Sources Science and Technology;2021-09-01

3. Microwave Plasma Systems in Optical and Mass Spectroscopy;Encyclopedia of Analytical Chemistry;2011-12-15

4. Experimental Studies on 70 GHz Slow Surface Wave Propagation in Transversely Magnetized Partially Filled Ring-Form Solid-Plasma Waveguide;Japanese Journal of Applied Physics;1995-11-15

5. Propagation Characteristics in a Transversely Magnetized 70 GHz Waveguide Containing a p-InSb Slab Carrying an Applied Current;Japanese Journal of Applied Physics;1995-05-15

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