Author:
Bian Yuyang,Guan Xijun,Liu Biqiu,Guo Xiaobo,Zhang Cong,Zhou Wenzhan,Huang Jun,Zhang Yu,Guo Lingyi,Liu Faquan,Song Jinyan,Sui Chunfei
Reference8 articles.
1. Reducing roughness in extreme ultraviolet lithography
2. Overlay and edge placement control strategies for the 7-nm node using EUV and ArF lithography;mulkens;Proc of SPIE,2015
3. Self-aligned double and quadruple patterning layout principle
4. Roughness Power Spectral Density as a Function of Aerial Image and Basic Process / Resist Parameters
5. Curacy enhancement in imagingbased overlay metrology by optimizing measurement conditions per layer;katz;Proc of SPIE,2021
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