Dry etch processing in fan-out panel-level packaging - An application for high-density vertical interconnects and beyond

Author:

Schein Friedrich-Leonhard1,Voigt Christian1,Gerhold Lutz1,Tsigaras Ioannis2,Elghazzali Mohamed2,Sawamoto Hirofumi2,Strolz Ewald2,Rettenmeier Roland2,Kahle Ruben3,Bottcher Lars3

Affiliation:

1. Technische Universität Berlin,Faculty IV – Electrical Engineering and Computer Science,Berlin,Germany

2. Business Unit Advanced Packaging Evatec AG,Trübbach,Switzerland

3. System Integration & Interconnection Technologies Fraunhofer IZM,Berlin,Germany

Publisher

IEEE

Reference13 articles.

1. A Proven Sub-??? Photoresist Stripper solution for Post Metal and Via Hole Processes;lee;J of Electrochem Society,1993

2. zero-undercut;raj;semi-additive copper patterning - a breakthrough for ultrafine-line RDL lithographic structures and precision RF thinfilm passives " 2015 IEEE 65th Electronic Components and Technology Conference (ECTC),2015

3. Fluorine-based plasmas: Main features and application in micro-and nanotechnology and in surface treatment

4. Capacitively coupled glow discharges at frequencies above 13.56 MHz

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