Affiliation:
1. Department of Electrical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, South Korea
Funder
Ministry of Trade, Industry and Energy
Korea Semiconductor Research Consortium (KSRC) for the Development of the Future Semiconductor Device
National Research Foundation of Korea (NRF) through the Korean Government
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Cited by
2 articles.
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1. Study of selective dry etching Si0.7Ge0.3 with different plasma source in process of gate-all-around FET;Advanced Etch Technology and Process Integration for Nanopatterning XIII;2024-04-09
2. Ultra-scaled CMOS devices and technology;Reference Module in Materials Science and Materials Engineering;2024