GaN-Based Ultraviolet Phototransistor With Two Parallel Polarization-Doped Junctions and an Al0.20Ga0.80N Insertion Layer to Achieve Low Dark Current and High Detectivity

Author:

Xuan Zhan1,Chu Chunshuang1,Tian Kangkai2,Zhu Zhengji1,Xie Zhiwei3,Jiang Ke3,Zhang Yonghui1ORCID,Sun Xiaojuan3,Zhang Zi-Hui1ORCID,Li Dabing3ORCID

Affiliation:

1. State Key Laboratory of Reliability and Intelligence of Electrical Equipment, Tianjin, China

2. School of Integrated Circuits, Guangdong University of Technology, Guangzhou, China

3. State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, China

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

China Postdoctoral Science Foundation

Science and Technology Program of Hebei

State Key Laboratory of Reliability and Intelligence of Electrical Equipment, Hebei University of Technology

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

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